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TOF-SIMS LEIS TOF-SIMS Products Time-of-Flight secondary ion mass spectrometry (TOF-SIMS) is a very sensitive surface analytical technique, well established for many industrial and research applications. It provides detailed elemental and molecular information about the surface, thin layers, interfaces of the sample, and gives a full three-dimensional analysis. The use is widespread, including semiconductors, polymers, paint, coatings, glass, paper, metals, ceramics, biomaterials, pharmaceuticals and organic tissue. The TOF.SIMS 5 and the TOF.SIMS 300 are the latest generation of high-end TOF-SIMS instruments developed over the last 25 years. Their design guarantees optimum performance in all fields of SIMS applications. LEIS Products The significant advantages of low energy ion scattering (LEIS) are extreme surface sensitivity and quantification. Contrary to many other established surface analysis techniques such as XPS or AES, which generally integrate over several atomic layers, LEIS characterises individual atomic layers. These features make the Qtac100 an extremely valuable instrument when information about the composition of the first atomic layer is required. Static depth profiling is used to analyse the sub-surface atomic layers and to determine layer thicknesses. The Qtac100 extends the range of LEIS applications to surface imaging and dynamic sputter depth profiling.